The FP7 NaPANIL EU project started in May 2008 with the objectives di develop nanostructured surfaces by nano imprinting lithography (NIL). This technology is suitable to fabricate multifunctional surfaces at low cost with tunable optical, electrical and mechanical properties changing the nanostructures geometry. Within NaPANIL, NIL technology will be optimized and transfer to industrial scale at all levels: modelling and design, metrology, materials, process and final application. At month 18, CRF started to integrate low cost NIL antireflective structures in proxy-HUD transparent displays to reduce multiple reflection on-board.